Test artifact for two photon polymerization
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Test artifact for two photon polymerization or laser direct writing
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Model information
- Source
- Printables
- Category
- Test Models
- License
- Creative Commons — Attribution
A test artifact for Direct Laser Writing, fs-LDW, MPA or whatever you want to call the technique where you can print with a resolution down to 100 nanometers. The model is actually something like a benchy but for printers that can create things smaller than the wavelength of visible light. Therefore you have to seperate each feature from another.
Additional information about the test artifact can be gathered from the test artifact. Like tilting of substrate, printing depths etc.
The fundamentels are written down in the following paper: https://iopscience.iop.org/article/10.1088/1361-6501/acc47a
Note: I am the first author of the paper and designed the model myself.